plasma chemical vapor deposition

dr. lee explained the principle of microwave plasma chemical vapor deposition.

李博士解释了微波等离子体化学气相沉积的原理。

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Fluorinated amorphous carbon films ( a C ∶ F) were deposited by microwave cyclotron resonance plasma chemical vapor deposition ( MWECR CVD) using benzene ( C 6H 6) and trifluoromethane ( CHF 3) as source gases.

用苯（C6H6）和三氟甲烷（CHF3）混合气体作源气体，采用永磁微波电子回旋共振等离子体化学气相沉积（MWECR CVD）技术，制备了氟化非晶碳膜（aC∶F）。

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KW microwave plasma chemical vapor deposition ( MP-CVD) of diamond film setup is developed successfully with a water-cooled stainless steel reaction chamber for large film square and higher deposition rate.

为提高微波等离子体化学气相沉积（MP－CVD）金刚石膜的面积和沉积速率，我们成功研制了5kW水冷不锈钢反应腔式MP－CVD装置。

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plasma chemical vapor deposition and its applications in superhard film synthesis

等离子体化学气相沉积及其在沉积超硬膜方面的应用

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Another process described is plasma chemical vapor deposition process ( PCVD), which is used to produce SFP α-Fe_2O_3 for the manufacture of gas sensitive materials.

等离子气相淀积工艺（PCVD），合成SFP'α-Fe2O3，用作气敏材料。

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Diamond films were synthesized by microwave plasma chemical vapor deposition ( MWPCVD) in a quartz bell jar.

在石英钟罩式微波等离子体化学气相沉积实验装置中研究了基片位置对金刚石薄膜沉积质量的影响。

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Temperature sensor of Cr metal membrane made by radio frequency plasma chemical vapor deposition is discussed.

采用等离子体溅射方法制备了Cr金属薄膜式温度传感器。

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nano silicon carbide film prepared by helicon wave plasma chemical vapor deposition

螺旋波等离子体化学气相沉积法制备纳米碳化硅薄膜

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Structures of Silicon Films Deposited by Inductively Coupled Plasma Chemical Vapor Deposition at Room Temperature

电感耦合等离子体CVD室温制备的硅薄膜的结构研究

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the samples were prepared by helicon wave plasma chemical vapor deposition technique. raman scattering, infrared absorption and optical absorption measurements were used to analyze the microstructure, hydrogen bonding configurations and energy band structures of the deposited films.

所用样品采用螺旋波等离子体化学气相沉积技术制备，利用Raman散射、红外吸收和光学吸收技术对薄膜的微观结构、氢的键合特征以及能带结构特性进行了分析。

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The globe-like diamond microcrystalline aggregates were fabricated by microwave plasma chemical vapor deposition ( MPCVD ) method.

在覆盖金属钛层的陶瓷上,利用微波等离子体化学气相沉积 ( MPCVD ) 法制备出类球状微米金刚石聚晶薄膜.

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Carbon nanotube films were synthesized on Ni substrate by microwave plasma chemical vapor deposition at temperature.

以镍片为基板材料,利用微波等离子体化学气相沉积法在低温条件下合成了纳米碳管膜.

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dr. lee explained the principle of dc arc discharge plasma chemical vapor deposition.

李博士解释了直流电弧放电等离子体化学气相沉积的原理。

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